By varying the energy and dose of tightly focused electron beams, researchers at the Georgia Institute of Technology and Pusan National University in South Korea have demonstrated the ability to both etch away and deposit high-resolution nanoscale patterns on two-dimensional layers of graphene oxide. The 3-D additive/subtractive "sculpting" can be done without changing the chemistry of the electron beam deposition chamber, providing the foundation for building a new generation of nanoscale structures.
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