Scott Clendenning joined the Intel Corporation in 2004 and leads the Atomic Layer Processing group in Components Research, Portland, Ore., developing chemical precursors and vacuum-based deposition and etch processes for thin films to meet next generation semiconductor device needs. He also serves as the Director of the Components Research’s nanofabrication facility. He participates actively in the thin film community as the industrial chair of the American Vacuum Society (AVS) Atomic Layer Deposition conferences ALD2021 and ALD2023 and has served on the executive technical advisory board of the Semiconductor Research Corporation (SRC). Prior to joining Intel, Scott obtained his doctorate in inorganic chemistry with Prof. John Nixon at the University of Sussex, UK, and completed post-doctoral research with Prof. Ian Manners at the University of Toronto, Canada.
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